The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric

The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric

碩士 === 國立清華大學 === 電子工程研究所 === 96 ===

Bibliographic Details
Main Authors: Sheng-Wen You, 尤聖文
Other Authors: Ya-Min Lee
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/45268420590822138824
id ndltd-TW-096NTHU5428041
record_format oai_dc
spelling ndltd-TW-096NTHU54280412015-11-27T04:04:16Z http://ndltd.ncl.edu.tw/handle/45268420590822138824 The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric 金屬(Al)/鋁酸鑭（LaAlO3）/矽(Si)薄膜電容器與場效電晶體之製作與電性分析 Sheng-Wen You 尤聖文 碩士 國立清華大學 電子工程研究所 96 Ya-Min Lee 李雅明 2008 學位論文 ; thesis 74 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 電子工程研究所 === 96 ===
author2 Ya-Min Lee
author_facet Ya-Min Lee
Sheng-Wen You
尤聖文
author Sheng-Wen You
尤聖文
spellingShingle Sheng-Wen You
尤聖文
The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric
author_sort Sheng-Wen You
title The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric
title_short The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric
title_full The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric
title_fullStr The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric
title_full_unstemmed The Fabrication and Characterization of Metal (Al)-Oxide-Si Capacitors and Field-effect Transistors Using LaAlO3 Gate dielectric
title_sort fabrication and characterization of metal (al)-oxide-si capacitors and field-effect transistors using laalo3 gate dielectric
publishDate 2008
url http://ndltd.ncl.edu.tw/handle/45268420590822138824
work_keys_str_mv AT shengwenyou thefabricationandcharacterizationofmetalaloxidesicapacitorsandfieldeffecttransistorsusinglaalo3gatedielectric
AT yóushèngwén thefabricationandcharacterizationofmetalaloxidesicapacitorsandfieldeffecttransistorsusinglaalo3gatedielectric
AT shengwenyou jīnshǔallǚsuānlànlaalo3xìsibáomódiànróngqìyǔchǎngxiàodiànjīngtǐzhīzhìzuòyǔdiànxìngfēnxī
AT yóushèngwén jīnshǔallǚsuānlànlaalo3xìsibáomódiànróngqìyǔchǎngxiàodiànjīngtǐzhīzhìzuòyǔdiànxìngfēnxī
AT shengwenyou fabricationandcharacterizationofmetalaloxidesicapacitorsandfieldeffecttransistorsusinglaalo3gatedielectric
AT yóushèngwén fabricationandcharacterizationofmetalaloxidesicapacitorsandfieldeffecttransistorsusinglaalo3gatedielectric
_version_ 1718137847962140672

Similar Items