Evaluating 3D Lithographic and Electromagnetic Simulation Software as the Nanometer Physical Layout Tools
碩士 === 國立清華大學 === 資訊工程學系 === 96 === Decreasing on the device size is the trend of the current semiconductor industry. Advanced process continues following with the Moore’s law and the semiconductor process moves from the sub-micro process into the nanometer process. Hence, the challenges about the c...
Main Authors: | Fu-Yen Hsiao, 蕭輔諺 |
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Other Authors: | Keh-Jeng Chang |
Format: | Others |
Language: | zh-TW |
Published: |
2007
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Online Access: | http://ndltd.ncl.edu.tw/handle/48262131642229757274 |
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