Evaluating 3D Lithographic and Electromagnetic Simulation Software as the Nanometer Physical Layout Tools

碩士 === 國立清華大學 === 資訊工程學系 === 96 === Decreasing on the device size is the trend of the current semiconductor industry. Advanced process continues following with the Moore’s law and the semiconductor process moves from the sub-micro process into the nanometer process. Hence, the challenges about the c...

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Bibliographic Details
Main Authors: Fu-Yen Hsiao, 蕭輔諺
Other Authors: Keh-Jeng Chang
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/48262131642229757274