Temperature Effect on Microstructure and Characteristics of Nickel Thin Film Deposited on silicon
碩士 === 國立中山大學 === 機械與機電工程學系研究所 === 96 === The microstructure and residual stress of Ni thin film coating on Si influence the properties significantly, which play an important role in advanced applications of the electric and magnetic properties. The properties of Ni thin film deposited on Si at vari...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/r2f7cp |