Growth behavior of electroless Ni-Co-P deposits
碩士 === 國立屏東科技大學 === 材料工程所 === 96 === Various electroless Ni-Co-P deposits were formed on silicon substrate in electroless baths using sodium hypophosphoric as reducing agent and nickel and cobalt sulphates as ion source at pH value of 9 and temperature from 55 to 85 ℃. The effect of atomic ratio of...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/65295334060057946062 |