Preparation of ZnO film on MgAl2O4(111) by metal-organic chemical vapor deposition
碩士 === 國立東華大學 === 材料科學與工程學系 === 96 === In this research, we studied the ZnO film deposited on MgAl2O4 (111) by metal-organic chemical vapor deposition. The chemical etching of MgAl2O4 was performed using H2SO4 and H3PO4 respectively to control the exposure of different surfaces of (111) MgAl2O4. At...
Main Authors: | Huan-Yu Lai, 賴煥友 |
---|---|
Other Authors: | Yi-Chia Chen |
Format: | Others |
Language: | zh-TW |
Published: |
2008
|
Online Access: | http://ndltd.ncl.edu.tw/handle/s795jg |
Similar Items
-
Preparation of directional one-dimensional ZnO nanorods by atmospheric chemical vapor deposition
by: Yao-Yin Shih, et al.
Published: (2008) -
Growth and Characterization of ZnO Thin Films by Chemical Vapor Deposition
by: Shih-Hsuan Yang, et al.
Published: (2007) -
Al doped ZnO nanorod growth by chemical vapor deposition
by: Wei-Qun Tang, et al.
Published: (2012) -
Growth and characterization of ZnO nanostructures by metalorganic chemical vapor deposition
by: Chia-Cheng Wu, et al. -
Investigation of Properties of ZnO Nanorad Structures by Chemical Vapor Deposition
by: Dai-Jang Chen, et al.
Published: (2007)