Effect of plasma treatment on the fluoride and oxide thin films
碩士 === 國立中央大學 === 光電科學研究所 === 96 === In this research, plasma treatment of various gases was implemented to influence the properties of fluoride (AlF3 and LaF3) and oxide (TiO2) thin films. The optical properties, surface modification and composition of thin films were analyzed in deep ultraviolet r...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/81160253283115277141 |