Study of Wafer Particle Reduction in Standard Mechanical Interface Environment

碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 96 === Nowadays the semiconductor engineering technical has came to the nanometer generation, thus the demanding to the size of polluted particle has became strictly critical. Standard mechanical interface system is now the main stream in 8 inch wafer trans...

Full description

Bibliographic Details
Main Authors: Yi-Min Chang, 張顗民
Other Authors: Chia-Fu Chen
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/27786307059339848240