The Simulation Studies of Increasing Depth of Focus of Forbidden Pitches by Scattering Bar for 32 nm Linewidth
碩士 === 國立交通大學 === 應用化學系所 === 96 === The lithographic simulation software of Prolith v. 9.0 from USA KLA-Tencor was used in this thesis, the positive bias, chromium whole scattering bar (CSB) and attenuated whole scattering bar (ASB) were used to study the relative issues of eliminating the forbidden...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/57121490686374332493 |