Using Dynamic Programming to Improve Overlay Control for Lithography Process
碩士 === 國立交通大學 === 管理學院碩士在職專班管理科學組 === 96 === Abstract Photo is a critical process and technology in semiconductor manufacturing and it plays a role how intelligent the IC processing, in which the quality of mask pattern will have a great direct impact on downstream processing. During lithographing p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54901877725117208557 |