A Study of High-k Dielectrics and Si Nano-crystals for ULSI Devices
博士 === 國立交通大學 === 電子工程系所 === 96 === In this dissertation, three approaches to incorporating nitrogen in CoTiO3 high-�� dielectric films, including the ion implantation of N2+, ion implantation of N+, and N2O plasma treatment, have been investigated. Nitrogen incorporation by ion implantation of N2+...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85514236533040458919 |