Core-Level Photoemission Study of Water exposing on NaCl/Ge(100)

• Main Authors: Chin-Hsun Weng, 翁靖勛
• Other Authors: Deng-Sung Lin
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/24435593406863239555

碩士 === 國立交通大學 === 物理研究所 === 96 === This article discuss water exposing on 1ML NaCl/Ge(100) sample for reacting and annealing observation. In RT, we use MBE to expose NaCl on clean Ge(100) surface. Then, use leak valve to expose water on sample. Finally, annealing sample and use the XPS to study surface behavior. For spectrum, we find Cl-Ge bond on Gemanium surface. After exposing water, we are not only observing Ge+ intensity increse but also Ge monoxide intensity.For binding energy, Sodium and Chlorine decrese about 0.3 eV. Finally, Water, Sodium and Chlorine desorb by annealing, but Ge monoxide doesn’t change.Also, we find binding energy change from Sodium and Chlorine state to Sodium-Chlorine state.