Core-Level Photoemission Study of Water exposing on NaCl/Ge(100)

碩士 === 國立交通大學 === 物理研究所 === 96 === This article discuss water exposing on 1ML NaCl/Ge(100) sample for reacting and annealing observation. In RT, we use MBE to expose NaCl on clean Ge(100) surface. Then, use leak valve to expose water on sample. Finally, annealing sample and use the XPS to study surf...

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Bibliographic Details
Main Authors: Chin-Hsun Weng, 翁靖勛
Other Authors: Deng-Sung Lin
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/24435593406863239555