A study on Nickel-silicide induced lateral crystallization of amorphous silicon thin film and its microstructural analysis
碩士 === 國立交通大學 === 材料科學與工程系所 === 96 === In this research, crystallization of a-Si films on glass substrate using Nickel disilicide (NiSi2) induced crystallization technique at low temperature and its corresponding lateral crystallization behavior has been studied. Nickel silicide layer was deposited...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43635324216693745644 |