Photo-resist Stripping Effects Evaluated by Argon or Nitrogen Micro-plasma System
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 96 === In this work, photo-resist stripping effects were evaluated by micro-plasma system. Argon or nitrogen was employed as the working gas under atmospheric pressure. Optical Emission Spectroscopy (OES) with oscilloscope was utilized for detecting real-time exci...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05620892172409965927 |