On the manufacture of microcrystalline silicon thin film by Pulsed-DC magnetron sputtering

碩士 === 明志科技大學 === 化工與材料工程研究所 === 96 === Hydrogenated microcrystalline silicon (μc-Si:H) films were prepared by a pulsed-DC magnetron sputtering method. The main sputtering parameters like working pressure, hydrogen concentration, sputtering power and temperature were systematically varied to explore...

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Bibliographic Details
Main Authors: Zhang,Xu-Hang, 張旭航
Other Authors: Cherng,Jyh-Shiarn
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/76579203254948082647