On the manufacture of microcrystalline silicon thin film by Pulsed-DC magnetron sputtering
碩士 === 明志科技大學 === 化工與材料工程研究所 === 96 === Hydrogenated microcrystalline silicon (μc-Si:H) films were prepared by a pulsed-DC magnetron sputtering method. The main sputtering parameters like working pressure, hydrogen concentration, sputtering power and temperature were systematically varied to explore...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2010
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Online Access: | http://ndltd.ncl.edu.tw/handle/76579203254948082647 |