Investigation of Hydrophilic Properties of TiOx and TiOxNy Thin Films Deposited by Radio-frequency Reactive Magnetron Sputtering

• Main Authors: Chieh-Chih Lin, 林建志
• Other Authors: G. S. Chen
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/43009345282020664851

碩士 === 逢甲大學 === 材料科學所 === 96 === Mixtures of argon and oxygen, excited by a radio-frequency generator, in an ultra-high-vacuum magnetron sputtering system, were used to bombard a metallic titanium target, and the transition from metallic to poisoned deposition modes induced by gradually varying the partial pressure of oxygen, were monitored in-situ by an optical emission spectroscope (OES). The OES monitors the featuring peaks of titanium and instantly provides a feedback to the mass flow controller to provide steady oxygen-to-argon partial pressure ratios (PO/Ar), and hence can deposit films with uniform distribution of composition from metallic, oxygen-incorporated titanium, titanium mono-oxide (TiO), to titanium dioxide (TiO2). Based on the results of OES monitor and Rutherford backscattering spectroscopy (RBS), thin films of TiO and TiO2, particularly with stoichiometric compositions, were fabricated, and the evolution of their microstructure and phase by isothermal annealing under vacuum and oxygen atmosphere is examined using transmission electron microscopy (TEM) as well as glancing-angle X-ray diffraction (GIXRD). Finally, the properties of the featured films, differing from each other in phase and grained structure, for photonic application will be addressed