Investigation of Hydrophilic Properties of TiOx and TiOxNy Thin Films Deposited by Radio-frequency Reactive Magnetron Sputtering

碩士 === 逢甲大學 === 材料科學所 === 96 === Mixtures of argon and oxygen, excited by a radio-frequency generator, in an ultra-high-vacuum magnetron sputtering system, were used to bombard a metallic titanium target, and the transition from metallic to poisoned deposition modes induced by gradually varying the...

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Bibliographic Details
Main Authors: Chieh-Chih Lin, 林建志
Other Authors: G. S. Chen
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/43009345282020664851