Electrical and Optical Characterization of ZnO:F Thin Films by Reactive Magnetron Sputtering
碩士 === 正修科技大學 === 電子工程研究所 === 96 === In this study, fluorine doped zinc oxide films have been prepared by rf reactive magnetron sputtering on corning 7059 glass substrates to study the possibility of obtaining ZnO:F transparent conducting thin film form sputtering of ZnF2 target. The effects of sput...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/12451629339768145543 |