Research on the Post-treatment of Reactive Sputtering Graphite for Field Emission Device

• Main Authors: Chin-Tze Huang, 黃欽澤
• Other Authors: Wen-Ching Shih
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/93r446

碩士 === 大同大學 === 光電工程研究所 === 95 === This thesis is divided into two parts. In the first part, we deposite the flake-like graphite with the mixture of methane, hydrogen and argon in the R.F. magnetron sputtering system. By means of changing the experiment parameters as temperature, gas ratio, power density, working pressure and DC-bias, we can find out lower turn-on field and larger electric current density. In the second part, we deal with the surface of flake-like graphite by hydrogen and oxygen plasma and make the heat treatment of hydrogen in quartz tube furnace. We hope that the post-treatment of the above can improve the field emission properties. With the different post-treatment, the surface morphology and quality will be different. In the experiment, we find that the better post-treatment which can reduce the turn-on field and raise the electric current density is the heat treatment of hydrogen in quartz tube furnace. The turn-on field is at 5.5 V/μm and electric current density reach 1m A/cm2 under 12 V/μm. In the part of hydrogen plasma post-treatment, the turn-on field is at 6 V/μm and electric current density reach 0.6 mA/cm2 under 12 V/μm.