Research on the Post-treatment of Reactive Sputtering Graphite for Field Emission Device
碩士 === 大同大學 === 光電工程研究所 === 95 === This thesis is divided into two parts. In the first part, we deposite the flake-like graphite with the mixture of methane, hydrogen and argon in the R.F. magnetron sputtering system. By means of changing the experiment parameters as temperature, gas ratio, power de...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93r446 |