Investigation of Fabricating Micro/Nano-Structures on CVD Diamond Film by Air Plasma and Reactive Ion Etching

• Main Authors: Hsia-Chen Lin, 林夏蓁
• Other Authors: 趙崇禮
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/30366648231883836401

碩士 === 淡江大學 === 機械與機電工程學系碩士班 === 95 === Diamond has many outstanding physical and chemical properties such as extreme hardness, low friction coefficient, high thermal conductivity, high mechanical strength, and high optical transparency. Therefore, several potential applications can be anticipated in electronics, optics, protective corrosion resistant coatings. In recent years, using chemical vapor deposition (CVD) methods to synthesize polycrystalline diamond is a mature and popular technology. This study not only indicated the producing mechanism of these microstructures on CVD diamond grains by atmospheric pressure air plasma (APAP) and reactive ion etching, but also used these microstructures applying to the thermal-chemical polishing and nano-imprint process. Scanning electron microscope, micro-Raman spectroscopy and α-step were used to study the surface morphology and component analysis, respectively. From the results showed that the microstructures could be successfully combined the thermal-chemical polishing method and these microstructures had a potential to apply in nano-imprint process.