| Summary: | 碩士 === 國立臺北科技大學 === 機電整合研究所 === 95 === Plasma technology is the key technology of high –Tech industry, it play very important role in different areas , like diamond films, semi-conductor, and nano material, etc. Microwave plasma is the important factor of plasma operation, thin film growth rate and thin film quality, to understand the performance and process of microwave plasma system in this experiment, and increase the process control and prediction ability. In this research, HFSS was used to simulate the change of cavity geometry, material, the electromagnetic fields distribution, impedance and predict if the region of resonant concentrate on the surface to enhance microwave power absorbed and avoid power loss. The result of this simulation and the experimental in this research are both indicated this system is not easy to form the uniform plasma, also indicate the plasma density distribution based on a breakdown field algorithm. According to the simulation result and related thesis, to enhance the microwave plasma simulation system. To modify the cavity geometry, let electromagnetic filed distribution concentrate on quartz glass tube without separate to chamber, and avoid energy loss. To modify the couples field propagation of cavity geometry, rectangular waveguide mode changed to cylindrical cavity mode or mode, it can avoid to excite other mode, the plasma become easy to launch, increase the power density, plasma uniform, and region of plasma, it will enhance plasma system performance。
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