Patent Map and Development Analysis for Integrated Passive Device

• Main Authors: Chih-nan Wei, 魏志男
• Other Authors: Sung-mao Wu
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/18880782076678304856

碩士 === 國立高雄大學 === 電機工程學系--先進電子構裝技術產業研發碩 === 95 === Patent map is a common method of the technology trend analysis method. Furthermore, the analysis of the patent concentrated and vacancy areas could design around the patent or create a new invention. In view of the advance of the semiconductor technology, the developed degree of the passive component in integrity and miniaturization is more less than semiconductor technology, so as to cause the difficulty in process integrity due to the gap of the passive component and semiconductor technology. Then, the semiconductor technology is suggested to integrate the passive component. It can greatly reduce the space occupied by passive component in the system and increase the availability of integrity with active element so as to bring the benefit in electronics and cost. This research begins from introducing the development history of passive component technology and then makes a brief introduction of the patent development, followed by proceeding the patent search about the thin film passive technology and making the patent abstract for searched patents. After that, to finish the patent map and the patent management chart. Finally, to analysis the technology development of the integrated passive device and to suppose the trend of the development in the future.