Development of Ultra-Low-Temperature Polycrystalline Silicon Thin Film Deposition technology
碩士 === 國立臺灣科技大學 === 電子工程系 === 95 === In order to realize the purpose of plastic substrate thin film transistor , We have successfully deposited semitransparent film that the main composition of the film is silicon nitride by using reactive sputtered method. And, it has light absorption (absorption c...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91500151403653087461 |