Synthesis of Low-K Films and Amorphous Silicon Films by Plasma Enhanced Chemical Vapor Deposition
碩士 === 國立臺灣科技大學 === 材料科技研究所 === 95 === In this thesis, we deposited low dielectric constant (low-k) and amorphous silicon films using by a parallel plate PECVD system. In depositing low-k films, we used γ-glycidoxypropyltrimethoxysilane (γ-GPS) and octafluoroluene(C7F8) as precursors, and added oxyg...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/d925jr |