Control of Texture of Platinum Bottom Electrode to Grow C-axis Preferentially Oriented AlN Thin Film by Sputtering
碩士 === 國立臺灣科技大學 === 材料科技研究所 === 95 === This study uses magnetron sputtering to develop platinum thin film, and utilize sputter conditions to control orientation of platinum film, which can be used as bottom electrode as well as the substrate for AlN thin film. The first part uses reactive sputtering...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/39532999620345372108 |