Bias Temperature Instability of Low Temperature Polycrystalline Silicon Thin-Film Transistor
碩士 === 臺灣大學 === 電機工程學研究所 === 95 === Our thesis studies about bias temperature instability of low temperature polycrystalline silicon thin film transistors. In this thesis, we use different gate bias, stress gate bias time, temperature, and device structures to do our experiment. The different device...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02775534356978041756 |