Stress induced wavelength shift of thin WDM thin film filter
碩士 === 國立中山大學 === 光電工程研究所 === 95 === Stress induced wavelength shift of thin film filter (TFF) were investigated. The substrate thickness of the TFF were greatly reduced by lapping to enhance the effects of stress. For CWDM TFF, no significant wavelength shift was observed by reducing their substrat...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/9j4mxq |
| Summary: | 碩士 === 國立中山大學 === 光電工程研究所 === 95 === Stress induced wavelength shift of thin film filter (TFF) were investigated. The substrate thickness of the TFF were greatly reduced by lapping to enhance the effects of stress. For CWDM TFF, no significant
wavelength shift was observed by reducing their substrate thickness from 300 μm to 70 μm. Further, thermal stress caused by direct heating the thin
TFF to 100℃ shows no effective changes of their optical characteristics. On the other hand, wavelength shifts induced by mechanical stress after reducing the substrate thickness of the DWDM TFF were observed. The maximum wavelength shift 3.8 nm was measured by lapping the substrate from 1mm to 120 μm. Additional wavelength shifts of 3.5 nm were
observed from the thin DWDM TFF if a lens fiber was brought into close contact with the thin DWDM TFF and was pushed forward for a distance of 45 μm.
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