| Summary: | 碩士 === 國立嘉義大學 === 光電暨固態電子研究所 === 95 === Abstract
In this thesis ,we combine two kinds of manufacturing technology:(1) metalorganic chemical vapor deposition (MOCVD)(2) scanning probe lithography (SPL) to obtain well ordered metallic nanostructure arrays of molybdenum (Mo) dots on Si(111) surface.In this way Si(111) surface was exposed to Mo(CO)6 gas at 100K,and then the high electric-field probe of scanning tunneling microscope was used to scan the Organic metal membrane Mo(CO)6. The organic metal membrane Mo(CO)6 in the scanned area was decomposed because of high electric field , and then the high-purity Mo clusters were formed on the Si(111) surface at 100K. This STM-assisted MOCVD allows us to draw regular metallic nanostructure arrays .
Utilizing such nanolithography we can obtain Mo nano-clusters of 1-2nm height and 10-20nm width by carefully controlling tunneling current and the exposure time of MOCVD. We also found that the nano-dots of Mo are metallic , which is evidenced from dI/dV curve of STS. This new type nanofabrication is a lithography method without the photo resistance ,so it can be developed to be the next-generation nano-lithography of the well ordered metallic nanostructure arrays in future nano- electronic industry.
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