An Accurate PLL Behavioral Model for Fast Monte Carlo Analysis under Process Variation
碩士 === 國立中央大學 === 電機工程研究所 === 95 === With the shrinking of device size in deep submicron process, impacts of process variation for circuit performance are more and more important, especially for analog circuits. Therefore design for manufacturability (DFM) and design for yield (DFY) become popular r...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/98833938874466167177 |