The effect of X-ray irradiation on the DNQ-Novolak type photoresist

碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 95 === With the flourishing development of photolithographic technology,it allows semiconductor technology to design more circuits in same area。Hence,faster,more multifunction and bigger capacity electronic products are available。The photoresist playing the...

Full description

Bibliographic Details
Main Authors: Hsiung-Min Lin, 林勳銘
Other Authors: Fu-Hsiang Ko
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/09397553232054004433