Investigation of Electrical Characteristics of KF Low-k Dielectric Material
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 95 === In this thesis, interaction between copper electrode and low dielectric constant KF ( Carbon-Doped silicon Oxide, CDO ) film was demonstrated. The Metal-Insulation-Semiconductor (MIS) capacitors were fabricated with a copper electrode. The breakdown electrical...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/25682379196474455954 |