RF-Sputtered LiNixCo1-xO2 (x=0、0.5) Cathode Films and the Electrochemical Properties
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 95 === In this work, LiNixCo1-xO2 (x=0~1.0) films were deposited by RF magnetron sputtering. First, the effect of various sputtering parameters (such as working pressure, O2 fraction, and rf power) on the film growth rate and film composition of HT-LiCoO2 deposite...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02237678959936568051 |