Micromechanical Tunable Capacitors for RF Applications
碩士 === 國立中興大學 === 機械工程學系所 === 95 === The fabrication of micromachined tunable capacitors using the standard 0.35 μm CMOS (complementary metal oxide semiconductor) process and a post-process have been implemented. The tunable capacitors have the advantage of large tuning range. The simulated results...
Main Authors: | Shih-Chieh Lin, 林士傑 |
---|---|
Other Authors: | Ching-Liang Dai |
Format: | Others |
Language: | zh-TW |
Published: |
2007
|
Online Access: | http://ndltd.ncl.edu.tw/handle/76959270192509411570 |
Similar Items
-
A Tunable Capacitor Based on MEMS Technology for RF Applications
by: M. M. Teymoori, et al.
Published: (2016-06-01) -
A Tunable Capacitor Based on MEMS Technology for RF Applications
by: M. M. Teymoori, et al.
Published: (2016-06-01) -
Tunable Filters and RF MEMS Variable Capacitors with Closed Loop Control
by: Zahirovic, Nino
Published: (2012) -
Tunable Filters and RF MEMS Variable Capacitors with Closed Loop Control
by: Zahirovic, Nino
Published: (2012) -
Lamb Wave AlN Micromechanical Filters Integrated With On-chip Capacitors for RF Front-End Architectures
by: Ji Liang, et al.
Published: (2015-01-01)