Micromechanical Tunable Capacitors for RF Applications

碩士 === 國立中興大學 === 機械工程學系所 === 95 === The fabrication of micromachined tunable capacitors using the standard 0.35 μm CMOS (complementary metal oxide semiconductor) process and a post-process have been implemented. The tunable capacitors have the advantage of large tuning range. The simulated results...

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Bibliographic Details
Main Authors: Shih-Chieh Lin, 林士傑
Other Authors: Ching-Liang Dai
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/76959270192509411570