Atomic Force Microscopy Field-induced Oxidation on Si3N4 Thin Film and Controlled Growth of Nickel Silicide Nanowires
碩士 === 中興大學 === 材料工程學系所 === 95 === Scanning probe lithography process is a low-cost method for fabricating nanometer-scale structures and adapts to investigate in laboratory. Relative humidity is a very important parameter in atomic force microscope (AFM) field-induced oxidation method. In this work...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/51939658974997322097 |