Study on Micro/Nano-Imprinting Formability of Polymer Resist Materials
碩士 === 國立高雄應用科技大學 === 機械與精密工程研究所 === 95 === In order to overcome the bottom neck of photolithography for producing tiny feature devices due to the limitation of light scattering and wave length of light source, nano imprint lithography is a promising technology. In traditional photolithography, the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03907663086677255438 |