Parameters Optimization for the Thin Film Process Using Plating Materials TiO2
碩士 === 逢甲大學 === 工業工程與系統管理學研究所 === 95 === The objective of this paper is to obtain the thin filmed process parameters to maximize the refraction rate. The plating material is TiO2 and using electron beam evaporation associated with ion-beam assisted deposition to experiment. The experiment factors ar...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68848439964606539606 |