The Prediction of Etching Depth and Yield of ECR-RIE Using Neural Network
碩士 === 中原大學 === 機械工程研究所 === 95 === In this research, back-propagation neural network was applied to setting up a prediction system for Etching depth which was able to simulate electron cyclotron resonance reactive ion etching. In the semiconductor wafer fab, we received data files in the etching pro...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/30700829994825425496 |