Characteristic Analysis of ZnO Thin Films Grown by MOCVD on Si and Oxide Single-crystal Substrates and Manufacture of ZnO LED
碩士 === 中華技術學院 === 電子工程研究所碩士班 === 96 === We develop a high-quality ZnO thin-film manufacturing procedure, using Zn(TMHD)2 as precursor, oxygen as reacting gas and argon as carrier gas, to deposit ZnO thin films on an N-Si (100), sapphire (Al2O3), ZnO single-crystal substrates. A single-wafer vertical...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/27193966844822565483 |