Application of Exposure Simulation System to CD ControlInvestigation at 130 nm Photolithography Node
碩士 === 元智大學 === 電機工程學系 === 94 === In the semiconductor process field, the control of the critical dimension (CD) is a major task, specially in the processes of mask manufacturing and wafer exposure. If the linewidth cannot be well controlled, then the resultant patterns on the wafer may shrink or br...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/38104771624404774218 |