Preparation and Characterization of ZrNχ Film Deposition Using the Pulsed Reactive Magnetron Sputtering
碩士 === 元智大學 === 化學工程與材料科學學系 === 94 === The deposited Zirconium-Nitride film on the substrate of a p-type (100) Si wafer has been investigated through pulsed-DC reactive magnetron sputtering. The characteristics and microstructure effects are surveyed by the various pulsing configurations (unipolar)...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/17633520992544563194 |