Theoretical Study of Carbonization of CxHy Species on Si(100) and (111) Surfaces : Mechanism and Kinetics

碩士 === 國立臺灣科技大學 === 化學工程系 === 94 === Modeling of chemical vapor deposition (CVD) processes requires knowledge of the gas-flow dynamics and chemical reactrion occurring in reactor. In order to go beyond simple growth rate predictions based on the lumped kinetics from incomplete experimental kinetic d...

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Bibliographic Details
Main Authors: Jiun-Wen Cheng, 鄭鈞文
Other Authors: Jyh-Chiang Jiang
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/hwtaj9