Theoretical Study of Carbonization of CxHy Species on Si(100) and (111) Surfaces : Mechanism and Kinetics
碩士 === 國立臺灣科技大學 === 化學工程系 === 94 === Modeling of chemical vapor deposition (CVD) processes requires knowledge of the gas-flow dynamics and chemical reactrion occurring in reactor. In order to go beyond simple growth rate predictions based on the lumped kinetics from incomplete experimental kinetic d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/hwtaj9 |