Modeling LPCVD for Improved Operation
碩士 === 國立臺灣大學 === 化學工程學研究所 === 94 === This work presents a physical model to simulate the film deposition in a batch LPCVD (Low Pressure Chemical Vapor Deposition) reactor for DRAM processing. The objective is to use this model to set proper reacting temperatures for lower defective rate and the hig...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/06774978675081899832 |