Characteristics of (TiO2)x(Ta2O5)1-x composite films prepared by Radio Frequency Ion Beam Sputtering Deposition

碩士 === 國立中央大學 === 光電科學研究所 === 94 === Since the coating materials are limited, mixing materials provide the way to solve the limitation. In this study (TiO2)x(Ta2O5)1-x composite films were prepared by radio frequency ion-beam sputtering deposition (RF-IBSD) of Ta and Ti targets . The symbol “x” indi...

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Bibliographic Details
Main Authors: Yung-Chi Wu, 吳永企
Other Authors: Cheng-Chung Lee
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/62117878190078966233