Electron-beam Lithography Proximity Effect Correction and Fabrication of Anti-reflection Coating with BA-m Benzoxazine film
碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 94 === There are two major topics in my research. One is the research of electron-beam lithography proximity effect correction. The other one is anti-reflectance coating. Integrated circuit (IC) technology has been advanced significantly over the last 40 years. T...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/08075334784736849943 |