Preliminary Experimental Investigation of a DC Gas Discharge With and Without Magnetron System

• Main Authors: Wei-Hao Liang, 梁偉豪
• Other Authors: Jong-Shinn Wu
• Format: Others
• Language: en_US
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/76005548637262812184

碩士 === 國立交通大學 === 機械工程系所 === 94 === In the recent years, the field of gas discharge plasma applications has rapidly expanded in semiconductor industry. The dc discharges has been applied in generating weakly ionized plasmas and has been studied the properties of plasma. The dc glow discharges have been used as the sputtering source to product thin film and other specialized application for a long time. As illustration in the Paschen curve, the pressure that discharges exceed breakdown voltage must be high enough ( ) and maintain in the usually manner by the secondary electron emission from the cathode. These pressures are higher than the optimum for deposition of sputtered atoms onto the substrate. This results in sputtered atom poor adhesion for the sputtered film. It is desirable to operate a sputtering discharge at lower pressures than to be obtained in a conventional glow discharge. This has led to the use of a dc magnetic field at cathode to confine the secondary electrons. This research will use Langmuir probe to measure the properties of dc discharges in the condition with and without magnetron and compare the difference between this two conditions.