Nove l Low Temperature Poly-Si Thin Film Nonvolatile Memory with Ge nanocrystals Trapping Layer

碩士 === 國立交通大學 === 電子物理系所 === 94 === In this thesis, we proposed the fabrication of low temperature polycrystalline silicon thin film with nonvolatile flash memory as named the SONOS-type poly-Si TFTs memories. To overcome the scaling limits of the conventional FG structure, Tiwari et al. for the fir...

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Bibliographic Details
Main Authors: Jyun-Shiang Huang, 黃竣祥
Other Authors: Tien-Sheng Chao
Format: Others
Language:en_US
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/89545642624070452610